Integrated Systems Nanofabrication Cleanroom

Fabricating the most demanding nanoscale structures and devices

Cleanroom Fabrication and Foundry

Integrated Systems Nanofabrication Cleanroom

The Integrated Systems Nanofabrication Cleanroom (ISNC) is a shared-use clean-room that provides state-of-the-art equipment, facilities, and technical expertise for fabricating the most demanding nano-scale structures and devices. The ISNC was created to support all aspects of nanofabrication-related research and to advance research and learning in nano-science.

The ISNC provides open-access of resources to all members and welcomes both academic and non-academic members equally. The ISNC staff has deep knowledge of fabrication techniques and has exten-sive experience with academic and commercial R&D projects. No fabrication experience is needed to become a member of the facility; our knowledge-able staff can train and guide new members working in the facility as well perform remote processing for members who cannot travel to the facility.

The ISNC facility consists of 9700 square ft of class 100 and class 1000 cleanroom space and offers processing equipment with a broad range of capabilities including working with substrate sizes from pieces to 150mm wafers.


At-a-Glance

  • No Membership fee, Pay as You Go Model
  • Provide foundry services for investigators seeking device design and fabrication
  • High-throughput 300-nm Optical Lithography and Inspection
  • Nano-scale Electron Beam Patterning
  • Experienced Professional Staff
  • Train professional engineers in fabrication techniques and engineering practices
  • Collaborate with industry and government Laboratories for technology transfer
  • ISNC is currently the only fully-equipped clean room for R&D locally

Equipments

Sputter Machine – ULVAC JSP 8000

E-Beam Evaporator -CHA Solution

Sputter Machine – Denton Desk V

Parylene Coating – SCS PDS-2010

Rapid Thermal Processing – MPTC RTP -600xp

Thermal Oxidation -Tystar Mini-3600

High Temperature Annealing Furance – Carbolite HTCR6/28

Vacuum Oven -Y YES LP III

Stepper – ASML PAS 5500/200

Track – SVG 8800

Stepper – ASML PAS 5500/200

Contact Printer – Karl Suss MA-6

Maskless Lithography – IMP SF-100

Manual Coaters – Headway PWM32

Wafer Bonder – Karl Suss SB6

Probe Station – M&M

Scribe & Break – Loomis LSD-100

Semiconductor FTIR – Nicolet ECO 1000s

Analytic SEM – JEOL 7500F

Profilometer – Vecco Dektak 150

Critical Dimension SEM – AMAT 7830i

AFM – Bruker Innova

Resistivity Measurement – Omnimap RS-35C

Vistec EBPG 5000+ES

Fluorine RIE -Oxford 80 Plus

Metal Etch – ULVAC 550

Down Stream and Barrel Ashers- Matrix 105 & Brason